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学会発表リスト |
発表年 |
著者 |
題名 |
学会名等 |
2008 |
天野剛、西山泰史、茂村弘之、寺澤恒男、須賀治、椎名健介、荒巻文朗、八坂行人 |
EUVLマスク欠陥のFIB-GAE修正プロセス開発 |
NGLワークショップ2008 |
2008 |
Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Tomokazu Kozakai; Syuichi Kikuchi; Kensuke Shiina; Anto Yasaka; Ryoji Hagiwara |
Damage analysis of EUV mask under Ga focused ion beam irradiation |
Photomask Japan 2008 |
2008 |
Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Ryoji Hagiwara; Kensuke Shiina; Shuichi Kikuchi; Anto Yasaka |
Evaluation of defect repair of EUVL mask pattern using FIB-GAE method |
Photomask Japan 2008 |
2008 |
西郷和隆, 石川恒志, 中上卓哉, 高岡修, 安武正敏, 菊池修一, 牛木辰男, 岩田 太 |
自己検知型カンチレバーを用いた液中ＡＦＭ観察法 |
春季第55回応用物理学関係連合講演会 |
2007 |
中上卓哉, 高岡修, 浜尾尚範, 渡邉将史, 安武正敏, 渡邉直哉, 白川部喜春，八坂行人 |
高精度微細加工用ＡＦＭカンチレバーの開発 |
秋季第68回応用物理学会学術講演会 |
2007 |
西郷和隆,浅尾 俊彦, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一 |
ナノ加工粉除去装置の開発とAFMナノ振動切削プロセスにおける効果 |
精密工学会秋季大会学術講演会 |
2007 |
浅尾 俊彦, 瀬田 翔平, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一 |
AFMナノスケール振動切削を用いたフォトマスクリペア技術の開発 |
精密工学会春季大会学術講演会 |
2007 |
M. Dellagiovanna, H. Miyashita, H. Yoshioka, S. Murai, T. Nakaue, O. Takaoka, S. Kikuchi, R. Hagiwara, and S. Benard |
A semi-automated AFM photomask repair process for manufacturing application using SPR6300 |
Photomask Technology 2007 |
2006 |
高岡修 |
FIBとSPMを用いたフォトマスク欠陥修正技術 |
精密工学会超精密位置決め専門委員会定例会 |
2006 |
F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui |
Advanced Photomask Repair Technology for 65nm Lithography (6) |
Photomask Technology 2006 |
2006 |
F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui |
Advanced Photomask Repair Technology for 65nm Lithography (5) |
Photomask Japan 2006 |
2005 |
Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida |
Advanced Photomask Repair Technology for 65nm Lithography (4) |
25th Annual BACUS Symposium |
2005 |
Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida |
Advanced Photomask Repair Technology for 65nm Lithography (3) |
Photomask Japan 2005 |
2004 |
Y. Yamamoto, M. Hasuda, H. Suzuki, M. Sato, O. Takaoka, H. Matsumura, N. Matsumoto, K. Iwasaki, R. Hagiwara, K. Suzuki, Y. Ikku, K. Aita, T.Kaito, T. Adachi, A. Yasaka |
FIB Mask Repair Technology for Electron Projection Lithography |
Photomask Japan 2004 |
2004 |
Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa |
Advanced Photomask Repair Technology for 65nm Lithography (2) |
24th Annual BACUS Symposium |
2004 |
Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, J. Tashiro, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa |
Advanced Photomask Repair Technology for 65nm Lithography (1) |
Photomask Japan 2004 |
2003 |
Y. Tanaka, Y. Itou, N. Yoshioka, R. Hagiwara, A.Yasaka, O. Takaoka, T. Kozakai, Y. Koyama, H. Sawaragi, Y. Sugiyama, M. Muramatsu, T. Doi, K. Suzuki, M.Okabe, M. Shinohara, O. Matsuda, K. Aita, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, and N. Hayashi |
Advanced Photomask Repair Technology for 90nm/ArF Lithography (3) |
23rd Annual BACUS Symposium |
2003 |
R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, O. Matsuda, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka |
Advanced Photomask Repair Technology for 100nm/ArF Lithography (2) |
Photomask Japan 2003 |
2003 |
八坂行人, 萩原良二, 高岡修, 小山喜弘, 中川良知, 荒巻文朗, 小堺智一, 松田修, 相田和男, 土井利夫, 村松正司, 鈴木勝美, 山本洋, 鈴木浩之, 篠原正至, 荷田昌克 |
集束イオンビームによるマスク修正技術 |
NGL2003次世代リソグラフィワークショップ |
2002 |
R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, H. Sawaragi, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka |
Advanced Photomask Repair Technology for 100nm/ArF Lithography |
22nd Annual BACUS Symposium |
2001 |
R.Hagiwara, A.Yasaka, O.Takaoka, T.Kozakai, S.Yabe, Y.Koyama, M.Muramatsu, T.Doi, K.Suzuki, M.Okabe, K.Aita, T.Adachi, s.Kubo, N.Yoshioka, H.Morimoto, Y.Morikawa, K.Iwase, N.Hayashi |
Advanced FIB mask repair technology in ArF lithography 3 |
Photomask Japan 2001 |
2000 |
S.Kubo, K.Hiruta, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi |
Advanced FIB mask repair technology in ArF lithography 2 |
20th BACUS symposium |
2000 |
K.Hiruta, S.Kubo, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi |
Advanced FIB mask repair technology in ArF lithography |
Photomask Japan 2000 |
1999 |
A.Yasaka |
FIB mask repair technology |
SEMI Technology Symposium '99 |
1999 |
Nishida, Naoki; Nishio, Yasuyuki; Kinoshita, Hiroshi; Takaoka, Osamu; Kozakai, Tomokazu; Aita, Kazuo |
Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask |
Photomask Japan 99 |
1998 |
T.Adachi, O.Takaoka, K.Aita, A.Yasaka |
FIB mask repair for MoSi-based PSMs |
High-throughput Charged-particle lithography workshop, 98 |
1997 |
A. Yasaka |
Recent topics in FIB mask repair |
High-throughput Charged-particle lithography workshop, 97 |
1997 |
A. Yasaka |
Repair system for future mask fabrication |
3rd symposium on 193nm lithography |
1997 |
S. Ruatta, E. Smith, A. Yasaka |
Advanced photomask reconstruction with the Seiko SIR 3000 |
17th BACUS symposium |
1996 |
Aita, Kazuo; Yasaka, Anto; Kitamura, Tadashi; Matsumura, Hiroshi; Satoh, Yasushi, Nakamura, Hiroshi, Fujikawa, Junji; Tsuchiya, Katsuhide, Noguchi, Shigeru |
Recent progress in repair accuracy of the focused ion-beam mask repair system |
Photomask Japan 96 |
1996 |
Yasushi Satoh, Hiroshi Nakamura,Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi, Kazuo Aita, Anto Yasaka |
Performance of gas-assisted FIB repair for opaque defects |
16th BACUS symposium |
1995 |
Aita, Kazuo; Koyama, Yoshihiro; Matsumura, Hiroshi; Kaito, Takashi; Satoh, Yasushi; Tsuchiya, Katsuhide; Noguchi, Shigeru |
New technique for repairing opaque defects |
Photomask Japan 95 |
1990 |
A.Yasaka, T.Yamaoka, T.Kaito, T.Adachi |
Experimental study on the influence of liquid metal ion source energy distribution on focused ion beam induced deposition |
Second Japan-US Seminar on Focused ion Beams and Applications |
1990 |
山岡、八坂 |
Ga液体金属イオン源のエネルギー分布のヒーターパワー依存性 |
90年秋季応用物理学会学術講演会 |
1987 |
Y.Nakagawa, S.Sasaki, M.Sato, J.Glanville, M.Yamamoto |
Recent progress on etching technology with focused ion beam in photomask repair |
Japan-US Seminar on Focused Ion Beam Technology and Applications |
1986 |
M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori |
Submicron mask repair using focused ion beam technology |
SPIE, Electron-Beam, X-ray, & Ion-Beam Techniques for submicronmeter lithographies V |
1986 |
M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori |
Submicron mask repair using focused ion beam technology |
17th理研シンポジウム Ion implantation and Submicron Fabrication |
1985 |
Takashi Kaito and Masahiro Yamamoto |
Mask repair using focused ion beam |
9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85) |
1985 |
Takashi Kaito and Masahiro Yamamoto |
Mask repair using focused ion beam |
9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85) |
1984 |
皆藤、中川、佐藤、山本 |
集束イオンビームCVDによるカーボン膜パターンの形成 |
84年第45回秋期応用物理学会学術講演会 |
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