| Overview |
The Review Station AFM unit can detect the position of 0.08µm level defects on a wafer accurately and in a short time. By using the coordinate data linkage and the super accurate position determination mechanism enabled by laser dispersion, observation of fine particles and defects in bare wafer is enabled. |
| Features |
1. SPA-465 system is designed for up to 300mm wafers. And SPA-460 system for 200mm.The system also includes fully automatic C to C.
2. Coordinate linkage with the optical particle detection systems. By using the dedicated software, specific particles can be reviewed with ease.
3. Scattered image of particles (defects) sized below 0.08µm in diameter can also be obtained using the built-in dark field laser scattering system. |
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