SIR5000
is a system developed for repairing defects on photomasks
and reticles for semiconductor devices. This system
can repair extremely small and complicatedly shaped
defects on photomasks, such as phase shift masks
and binary masks, with high accuracy.
SIR7000FIB
is designed to repair photomask defects targeting
the 65nm semiconductor device node. This system
can repair extremely small and complicatedly shaped
defects on photomasks, such as phase shift masks
and binary masks, with high accuracy.
SPR6300
Photomask Repair
System
This
system employs scanning probe microscope technology
with a diamond probe to repair opaque defects on
a photomask and also makes it possible to remove
extremely small foreign substances. Accommodating
the 65-nm node generation and beyond.
SIR8000
Liquid Crystal Photomask
Repair System
The
new SIR8000 liquid crystal photomask defect repair
system introduces FIB repair technology into liquid
crystal mask repair, realizing high repair accuracy
for both white and black defects. This system is
the world's first FIB photomask repair system that
supports FPD large-size photomasks of the 7th generation
or later
