Based
on the high performance automation platform
of SIINTLs SMI3000SE/TB Double Beam/Triple
Beam platform, this new product is equipped
with the GeminiR electron optics of Carl
Zeiss NTS to offer 3 nm SEM resolution and
4 nm SEM resolution. Inheriting all the
user-centric functionality of the SMI3000
series, XVision 300 is an essential tool
for process monitoring in cleanrooms as
well as for wafer-level failure analysis
in the wafer fab laborato-ries.
NVision
40
FIB-SEM Cross
Beam System
As
a laboratory tool compatible with samples
below 100mm, this system is designed to
be used in wide range of fields including
material analysis, semiconductor and life
science. Equipped with SIINT FIB column
and Carl Zeiss EB column, it enables high-quality
TEM sample preparation and high throughput
performance.
The
Focused Ion Beam (FIB) System achieves the worldfs
smallest beam diameter of 4nm.The scanning ion
microscope function, sputter etching function
with ion beam irradiation, and deposition function
by squirting source gas and ion beam irradiation
enables minute scale cross-section processing
and observation of selected areas on a 50mm sample.
Infrared Observation
Optical Microscope with Laser Marking Function
This
system is effective for backside analysis of devices
and position determination on CMP sample for FIB
processing. Infrared observation enables the observation
of the device from the backside through silicon
substrate. Laser marking and coordinate linkage
to the defect point detected with defect inspection
equipment is also possible.
