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News Release
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November 30, 2004

Releases 2 Models of FIB-SEM Hybrid System Compatible with 200/300 mm Wafer

Achieving High-Resolution Observation and High-Precision Processing Using FIB/SEM Double Beam

SII Nanotechnology Inc. will release on December 1 two new models of the SMI3000SE series that combine FIB (Focused Ion Beam) technology, with SEM (Scanning Electron Microscope) technology. These new models are compatible with large wafer samples: the SM13200SE for 200 mm wafer, and the SMI3300SE for 300 mm wafer. Delivery of SMI3300SE to major domestic semiconductor device manufacturers will begin in December, and will extend its distribution to the global market in 2005.

The SMI3000SE series is now comprised with three models: SMI3050SE released in spring this year, SMI3200SE and SMI3300SE, and compatible with wafer samples sized 50, 200, and 300mm.

[Main Features of SMI3200SE and SMI3300SE]

(1) Automatic Cut & See function
This feature is effective when performing automatic cross-sectional processing of selected area on a wafer with FIB and automatically conducting SEM cross-sectional observation. In addition to allow the user to review the automatically obtained cross-sectional images one by one, the feature enables three-dimensional observation when combined with 3D visualization software.

(2) Continuous A-TEM
This feature enables automatic TEM sample fabrication of multiple selected areas on a wafer when the processing recipe is registered in advance. The feature permits unattended continuous automatic processing at night, thereby improving throughput, enhancing operability and greatly reducing total cost.

(3) Real-time high-resolution FE-SEM observation
This feature enables real-time high-resolution SEM observation of the FIB processing status at all times. The feature is utilized with TEM sample fabrication as well as cross-sectional SEM observation and elemental analysis.

(4) Linkage with external systems
The positional coordinate linkage function which links the system with defect/failure inspection systems, CAD navigation systems and optical microscopes enables simple identification of processing locations.

(5) Micro-probing system
The micro-probing system allows the user to perform versatile probing operations of nanometer precision in a vacuum chamber.

yPricez
SMI3200SE: From 160 million yen SMI3300SE: From 290 million yen
SMI3300SE FIBESEM•”‡‘•’u
yTarget sales amountz
First year for both models: 10 units
ySale start datez
December 1, 2004


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