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Corporate History |
Product History |
| 2007 |
Yokohama Demonstration Laboratory was established in Yokohama, Kanagawa Prefecture. |
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| 2006 |
Announced global strategic alliance with Carl Zeiss NTS of Germany to develop and sell products jointly. |
Introduced FIB-SEM Hybrid Systems jointly developed with Carl Zeiss NTS (XVision 300, NVision 40) |
| 2005 |
SII NanoTechnology USA acquired the X-ray Detector Business from U.S. Radiant Detector Technologies |
Introduced world's first FIB-EB-Ar triple beam system (SMI3000TB series) |
| 2005 |
Company head office moved to Chuo-ku, Tokyo |
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| 2005
| SII NanoTechnology USA Inc. was founded in California, U.S.A |
Introduced
a FIB mask repair system compliant with 65 nm node (SIR7000FIB) |
| 2004 |
SII NanoTechnology (Shanghai) Inc. was founded in Shanghai, China |
Introduced
a hazardous substance measurement software jointly developed
with Matsushita Electric Industrial Co., Ltd. (HS Easy) |
| 2004 |
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Introduced a
FIB-SEM hybrid system (SMI3000SE series) |
| 2004 |
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Introduced a hazardous substance monitor, using no
liquid nitrogen (SEA1000A) |
| 2003 |
SII NanoTechnology acquired the scientific instruments business of Seiko Instruments through partition of the corporation, and acquired all shares of Epolead Service. |
Introduced a FIB system with resolution of 4 nm (SMI3000 series) |
| 2003 |
SII Microscope officially changed company name to SII NanoTechnology Inc. |
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| 2002 |
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Introduced a FIB mask repair system compliant with 90 nm node (SIR5000) |
| 2001 |
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Developed world's first microscopic area coating thickness gauge with 75W high output (SFT9300 series) |
| 2000 |
Seiko Instruments founded SII Microscope Inc., the predecessor of this company, to develop, manufacture and sell compact probe microscopes. |
Introduced a Scanning Ion Microscope, FIB resolution of 5nm (SMI2000 series) |
| 1999 |
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Introduced a Simultaneous ICP-OES equipped with CCD detector (SPS5000) |
| 1999 |
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Introduced a compact and portable XRF analyzer
(SEA200) |
| 1998 |
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Introduced a multi-function
SPM unit (SPA-400) |
| 1998 |
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Introduced a compact
tabletop probe microscope (Nanopics) |
| 1996 |
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Introduced a mask
repair system compliant with 0.18 design rule (SIR3000) |
| 1995 |
Seiko Instruments founded Epolead Service Inc. to provide maintenance and service for scientific instrument products and to sell consumables. |
Introduced thermal analysis
system (EXSTAR6000 series) |
| 1995 |
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Introduced an environment
control SPM (SPA-300HV) |
| 1995 |
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Introduced a scanning
near-field optical/atomic-force microscopy (SNOAM) |
| 1994 |
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Introduced a scanning ion microscope, FIB resolution of 10nm (SMI9000 series) |
| 1994 |
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Achieved the world's first 50µm beam diameter
in XRF analyzer for
microscopic area (SEA5100) |
| 1992 |
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Achieved the worlds' smallest collimator diameter (50µm) of XRF coating thickness gauge by adopting
micro-focus tube (SFT3000 series) |
| 1991 |
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Introduced an Atomic Force Microscope (SFA300) |
| 1991 |
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Introduced a high-speed automatic analysis ICP-OES, equipped with
dual monochromator and AI function (SPS4000) |
| 1990 |
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Introduced a probe station compatible with multi-function probe microscope (SPI3600) |
| 1988 |
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Introduced the world's first XRF coating thickness gauge for microscopic area, quipped with
in-house semiconductor detector (SFT8000) |
| 1987 |
Seiko Instruments and Electronics officially changed company name to Seiko Instruments Inc. |
Introduced Japan's first STM (SAM3000) |
| 1987 |
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Introduced an ICP-OES equipped with vacuum spectrograph (SPS1200V) |
| 1986 |
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Introduced a multi-task thermal
analysis system (SSC5000 series) |
| 1986 |
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Introduced a FIB cross section processing/observation
system with FIB resolution
of 50 nm (SMI8000 series) |
| 1986 |
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Successfully observed an atomic image (NbSe2) with a probe microscope for the first time in Japan, under the guidance of the Electrotechnical Laboratory. |
| 1985 |
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Introduced Japan's first photomask clear defect repair system using focused ion beam (SIR1000) |
| 1983 |
Daini Seikosha officially changed company name to Seiko Instruments and Electronics Ltd. |
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| 1980 |
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Introduced Japan's first computer-controlled sequential type ICP-OES (JY-38II) |
| 1979 |
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Introduced the world's first horizontal differential type TG/DTA (SSC560G, SSC560GH) |
| 1978 |
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Introduced a multi-channel ICP-OES (JY48P) |
| 1978 |
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Introduced World's first desktop fluorescent X-ray coating thickness gauge that does not use radioisotopes for use in microscopic areas (SFT155/156) |
| 1978 |
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World's first to introduce computer technology to thermal analysis systems (SSC560) |
| 1974 |
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Introduced Introduced adiabatic scanning calorimeteriSSC510j |
| 1973 |
Daini Seikosha established the Oyama Unit in Sunto-gun, Shizuoka Prefecture, as a scientific instrument manufacturing plant. |
Introduced
XRF analyzer for analysis
of sulfur in oil (SFA130) |
| 1972 |
Daini Seikosha formed a Scientific Instruments division to manufacture and sell analysis and measurement instruments. |
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| 1971 |
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Developed atomic absorption spectrometer, thermal analysis system, and fluorescent X-ray coating thickness line gauges as its main products. |
| 1970 |
Daini Seikosha established an internal R&D Center for product diversification, and began research and development in the analysis and measurement instrument business. |
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| 1937 |
Daini Seikosha Co., Ltd. (predecessor of Seiko Instruments Inc.) was founded as the watch manufacturer for the Seiko Group. |
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| 1881 |
Kintaro Hattori founded K. Hattori and Co., Ltd. (predecessor of Seiko Corporation), a watch and clock retail store. |
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